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Home > Anterior Cervical Plating Systems > CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
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CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating

CVD Ald Atomic Layer Deposition System for Powder Coating Plating

Customization: Available
After-sales Service: Onlin
Warranty: 1
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Product Description

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Basic Information

Model NO.
CY-ALD
Type
Coating Production Line
Coating
Vacuum Coating
Certification
CE
Condition
New
Wafer Dimension
8 Inch and Below
Wafer Temp
Rt-400c (±0.1c)
Precursor Lines
Three Lines (Optional more)
ALD Valve
Swagelok ALD Swift Valve
Background Vacuum
<5*10-3torr
Gas Carrier
N2 or Ar
Production Capacity
200 Sets Per Month
⚙️

CVD ALD Atomic Layer Deposition System

The Thermal Atomic Layer Deposition System is a single-wafer deposition system specially designed for scientific research and small-scale experimental industrialization. The system is fully CE compliant and is widely utilized in micro-electronics, nano-materials, optical films, and solar battery technology.

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Advanced Control System: Integrated software for technological formulation, parameter setting, interlocking alarms, and state supervisory control.

Deposition Materials

Elementary: Co, Cu, Ta, Ti, W, Ge, Pt, Ru, Ni, Fe Nitride: TiN, SiN, AlN, TaN, ZrN, HfN, WN Oxide: TiO2, HfO2, SiO2, ZnO, ZrO2, Al2O3, La2O3, SnO2 Others: GaAs, AlP, InP, GaP, InAs, LaHfxOy, SrTiO3

Primary Applications

  • 🔹High-k gate oxides & Storage capacitor dielectrics
  • 🔹High aspect ratio diffusion barriers for Cu interconnects
  • 🔹Pinhole-free passivation layers for OLEDs and polymers
  • 🔹Highly conformal coatings for MEMS and Nanoporous structures
  • 🔹Solar battery, Flat plate display, and Optical thin-films
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Technical Parameters

Parameter Item Specifications
Wafer Dimension8 inch and below
Wafer TemperatureRT-400ºC, Precision ±0.1ºC
Precursor Lines3 lines (standard), expandable
Line/Source TemperatureRT-200ºC, Precision ±0.1ºC
ALD ValveSwagelok ALD swift valve
Background Vacuum<5*10⁻³ Torr
Growing ModeConsecutive or interval deposition
Control SystemPLC + Touch screen / Display
Power Supply220V/20A AC, 50-60Hz
Deposition Heterogeneity< ±1%
Instrument Dimensions600mm x 600mm x 1100mm
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Product Gallery

ALD System View 1
ALD System View 2
ALD System View 3
ALD System View 4
ALD System View 5
ALD System View 6
Technical Layout Internal Components

Frequently Asked Questions

Are you a professional manufacturer?
Yes, we are professional laboratory instrument manufacturers with a dedicated design team and factory, ensuring high technical standards and optimal pricing.
What is the after-sales service policy?
We offer a 12-month warranty period and lifetime maintenance. Our technical departments respond within 24 hours to resolve any issues.
What is the typical delivery and customization time?
Standard stock items ship in 5-10 days. For customized instruments tailored to specific requirements, it typically takes 30-60 days.
How do you handle different power supply requirements?
We provide transformers and specific power plugs according to your local regional requirements.
What payment methods are accepted?
We accept T/T, L/C, D/P, and other standard international payment methods; Trade Guarantee is highly recommended.
How is the equipment packaged for shipping?
Goods are secured in standard export fumigation wooden boxes. We offer express, air, and sea shipping based on customer needs.

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